Relax gas discharge laser lithography light source
US7088758B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 1, 2004 |
| Grant date | Aug 8, 2006 |
| Priority date | — |
| Expiry date | Oct 1, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/1055
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.