Immersion lithography laser light source with pulse stretcher
US7643528B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 10, 2007 |
| Grant date | Jan 5, 2010 |
| Priority date | — |
| Expiry date | Nov 19, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70583
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.