Heungsoo Park
3Patents
3h-index
5Co-inventors
33Inventor score
Filing activity: Apr 29, 2002 → Feb 4, 2003
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6838300B2 | Chemical treatment of low-k dielectric films | Electricity | 16 | Expired |
| US6713402B2 | Methods for polymer removal following etch-stop layer etch | Electricity | 15 | Expired |
| US6645781B1 | Method to determine a complete etch in integrated devices | Electricity | 5 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.