Hsiu-Lan Lee
2Patents
2h-index
3Co-inventors
27Inventor score
Filing activity: Jul 24, 1997 → Jun 4, 1998
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5904154A | Method for removing fluorinated photoresist layers from semiconductor substrates | Electricity | 62 | Expired |
| US6423646B1 | Method for removing etch-induced polymer film and damaged silicon layer from a silicon surface | Chemistry; Metallurgy | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.