Hung-Yang Chen
3Patents
0h-index
11Co-inventors
28Inventor score
Filing activity: Feb 27, 2017 → Nov 17, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US12360453B2 | PAG-free positive chemically amplified resist composition and methods of using the same | Physics | 0 | Active |
| US10815236B2 | Semiconducting polymer | Emerging Cross-Sectional Technologies | 0 | Active |
| US12276909B2 | Novolak/DNQ based, chemically amplified photoresist | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.