Ivan Oshchepkov
2Patents
1h-index
6Co-inventors
30Inventor score
Filing activity: Dec 28, 2015 → Dec 18, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9633838B2 | Vapor deposition of silicon-containing films using penta-substituted disilanes | Electricity | 2 | Active |
| US11482414B2 | Ultra-low temperature ALD to form high-quality Si-containing film | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.