Jens Hassmann
2Patents
0h-index
5Co-inventors
31Inventor score
Filing activity: Mar 12, 2002 → Feb 17, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9898572B2 | Metal line layout based on line shifting | Physics | 0 | Active |
| US6858445B2 | Method for adjusting the overlay of two mask planes in a photolithographic process for the production of an integrated circuit | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.