Jin-Hao Jhang
2Patents
0h-index
2Co-inventors
18Inventor score
Filing activity: Jul 26, 2021 → Aug 2, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11629271B2 | Titanium dioxide containing ruthenium chemical mechanical polishing slurry | Electricity | 0 | Active |
| US12234382B2 | CMP composition including anionic and cationic inhibitors | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.