Jon E. Lieberman
3Patents
2h-index
12Co-inventors
41Inventor score
Filing activity: Mar 24, 1989 → May 25, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5909658A | High speed electron beam lithography pattern processing system | Electricity | 23 | Expired |
| US4945246A | Tri-deflection electron beam system | Electricity | 16 | Expired |
| US6573514B2 | Method for aligning electron beam projection lithography tool | Electricity | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.