Tri-deflection electron beam system
US4945246A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 24, 1989 |
| Grant date | Jul 31, 1990 |
| Priority date | — |
| Expiry date | Mar 24, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/1474
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A three-stage E-beam deflection system employs breaking the entire field to be scanned into clusters and sub-fields. The scanning provided by the first stage of deflection which scans within the entire field is rectilinear and discontinuous with the scan stopping in the center of each of the clusters where an exposure is to be made, and scanning is the same within each cluster from sub-field to sub-field. The scanning within a cluster by the second stage stops in the center of each sub-field where exposure is to be made. The third stage uses high speed electrostatic deflection to provide scanning with a vector scanning mode within the sub-field being scanned.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.