Method for aligning electron beam projection lithography tool
US6573514B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 25, 2001 |
| Grant date | Jun 3, 2003 |
| Priority date | — |
| Expiry date | Sep 29, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3045
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of aligning elements of an electron beam beam tool such as an electron beam projection lithography tool utilizes a detector such as a pinhole and scintillator over which an image is rastered to provide a real-time display of a projected image at a target plane. A shaping aperture is projected and the detector centered thereon. A reticle sub-field image is then centered on and aligned with the image of the shaping aperture and the compound image thus formed is rotated using deflectors. The compound image is then aligned with movement of a translation device at the target plane using lenses and compound image orientation is corrected by electrical or mechanical rotation of the deflectors. Sub-field size can then be adjusted and any observed further rotation of the compound image may be corrected by reiteration of rotation adjustment with lenses and deflectors, in sequence.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.