Jonathan O. Burrows
2Patents
2h-index
10Co-inventors
31Inventor score
Filing activity: Feb 22, 2005 → Oct 28, 2005
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7434197B1 | Method for improving mask layout and fabrication | Physics | 12 | Expired |
| US7568180B2 | Generalization of the photo process window and its application to OPC test pattern design | Physics | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.