Generalization of the photo process window and its application to OPC test pattern design

US7568180B2 · kind B2 · utility

Assignee

• PDF SOLUTIONS, INC. · US

Inventors

• Hans Eisenmann · Tutzing, DE
• Kai Peter · Friedberg, DE
• Dennis Ciplickas · San Jose, US
• Jonathan O. Burrows · San Jose, US
• Yunqiang Zhang · Sunnyvale, US

Key dates

• Filing date: Feb 22, 2005
• Grant date: Jul 28, 2009
• Expiry date: Feb 22, 2025

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/705
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method comprises the steps of: (a) simulating on a processor a fabrication of a plurality of layout patterns by a lithographic process; (b) determining sensitivities of the layout patterns to a plurality of parameters based on the simulation; (c) using the sensitivities to calculate deviations of the patterns across a range of each respective one of the parameters; and (d) selecting ones of the patterns having maximum or near-maximum deviations to be used as test patterns.