Joseph E. Gortych
8Patents
5h-index
7Co-inventors
52Inventor score
Filing activity: Aug 31, 1994 → Aug 17, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5680588A | Method and system for optimizing illumination in an optical photolithography projection imaging system | Physics | 102 | Expired |
| US6939009B2 | Compact work light with high illumination uniformity | Mechanical Engineering; Lighting; Heating | 22 | Expired |
| US5614990A | Illumination tailoring system using photochromic filter | Physics | 20 | Expired |
| US8026519B1 | Systems and methods for forming a time-averaged line image | Performing Operations; Transporting | 11 | Active |
| US5760461A | Vertical mask for defining a region on a wall of a semiconductor structure | Emerging Cross-Sectional Technologies | 6 | Expired |
| US5668018A | Method for defining a region on a wall of a semiconductor structure | Emerging Cross-Sectional Technologies | 4 | Expired |
| US8822353B2 | Systems and methods for forming a time-averaged line image | Performing Operations; Transporting | 3 | Active |
| US8399808B2 | Systems and methods for forming a time-averaged line image | Electricity | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.