Systems and methods for forming a time-averaged line image
US8399808B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 10, 2011 |
| Grant date | Mar 19, 2013 |
| Priority date | — |
| Expiry date | Aug 14, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67253
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Systems and methods for forming a time-average line image are disclosed. The method includes forming a line image with a first amount of intensity non-uniformity. The method also includes forming and scanning a secondary image over at least a portion of the line image to form a time-averaged modified line image having a second amount of intensity non-uniformity that is less than the first amount. Wafer emissivity is measured in real time to control the intensity of the secondary image. Temperature is also measured in real time based on the wafer emissivity and reflectivity of the secondary image, and can be used to control the intensity of the secondary image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.