Kenneth J. Polasko
3Patents
3h-index
6Co-inventors
36Inventor score
Filing activity: Oct 25, 1988 → Sep 24, 1990
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4895780A | Adjustable windage method and mask for correction of proximity effect in submicron photolithography | Physics | 66 | Expired |
| US5010018A | Method for forming Schottky photodiodes | Electricity | 9 | Expired |
| US4982246A | Schottky photodiode with silicide layer | Electricity | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.