Inventor · Kluang, MY

Koh Yee Wee

2Patents
2h-index
2Co-inventors
27Inventor score

Filing activity: Feb 24, 2004 → Apr 25, 2006

Most-cited inventions

PatentTitleAreaCited byStatus
US7052932B2 Oxygen doped SiC for Cu barrier and etch stop layer in dual damascene fabrication Emerging Cross-Sectional Technologies 13 Expired
US7538353B2 Composite barrier/etch stop layer comprising oxygen doped SiC and SiC for interconnect structures Emerging Cross-Sectional Technologies 6 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.