Kozo Ogino
15Patents
4h-index
12Co-inventors
53Inventor score
Filing activity: Mar 16, 2001 → Jan 31, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6677089B2 | Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure method | Emerging Cross-Sectional Technologies | 43 | Expired |
| US6544700B2 | Charged particle beam exposure method | Emerging Cross-Sectional Technologies | 42 | Expired |
| US7205078B2 | Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method | Emerging Cross-Sectional Technologies | 9 | Expired |
| US7240307B2 | Pattern size correcting device and pattern size correcting method | Physics | 4 | Expired |
| US7500219B2 | Exposure data generator and method thereof | Electricity | 3 | Active |
| US8429573B2 | Data generation method for semiconductor device, and electron beam exposure system | Electricity | 2 | Active |
| US8048600B2 | Parameter extracting method | Emerging Cross-Sectional Technologies | 1 | Active |
| US8298732B2 | Exposure method and method of making a semiconductor device | Electricity | 1 | Active |
| US7977018B2 | Exposure data preparation method and exposure method | Emerging Cross-Sectional Technologies | 1 | Active |
| US8022376B2 | Method for manufacturing semiconductor device or photomask | Electricity | 0 | Active |
| US7861210B2 | Exposure data generator and method thereof | Electricity | 0 | Active |
| US8158312B2 | Exposure method using charged particle beam | Emerging Cross-Sectional Technologies | 0 | Active |
| US7939246B2 | Charged particle beam projection method | Performing Operations; Transporting | 0 | Active |
| US8141009B2 | Preparing data for hybrid exposure using both electron beam exposure and reticle exposure in lithographic process | Physics | 0 | Active |
| US7707540B2 | Exposure data generation method and device, exposure data verification method and device and storage medium | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.