Mark E. Lagus
5Patents
3h-index
15Co-inventors
50Inventor score
Filing activity: Aug 28, 1997 → Jul 17, 2008
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5965309A | Focus or exposure dose parameter control system using tone reversing patterns | Physics | 62 | Expired |
| US6004706A | Etching parameter control system process | Physics | 44 | Expired |
| US5969273A | Method and apparatus for critical dimension and tool resolution determination using edge width | Physics | 29 | Expired |
| US6656369B2 | Method for fabricating a scanning probe microscope probe | Performing Operations; Transporting | 1 | Expired |
| US8340800B2 | Monitoring a process sector in a production facility | Emerging Cross-Sectional Technologies | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.