Mark L. Reath
4Patents
3h-index
17Co-inventors
47Inventor score
Filing activity: Jan 16, 2001 → Jul 25, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7864502B2 | In situ monitoring of wafer charge distribution in plasma processing | Emerging Cross-Sectional Technologies | 10 | Active |
| US7094614B2 | In-situ monitoring of chemical vapor deposition process by mass spectrometry | Chemistry; Metallurgy | 6 | Expired |
| US8634949B2 | Manufacturing management using tool operating data | Emerging Cross-Sectional Technologies | 4 | Active |
| US10186439B2 | Systems and methods for sensing process parameters during semiconductor device fabrication | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.