Mark Williams
6Patents
2h-index
11Co-inventors
44Inventor score
Filing activity: Nov 17, 2003 → Apr 23, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7075623B2 | Flexure-supported split reaction mass | Physics | 3 | Expired |
| US8976336B2 | Shear-layer chuck for lithographic apparatus | Emerging Cross-Sectional Technologies | 2 | Active |
| US8786832B2 | Shear-layer chuck for lithographic apparatus | Emerging Cross-Sectional Technologies | 1 | Active |
| US8779635B2 | Arrangement of reticle positioning device for actinic inspection of EUV reticles | Physics | 1 | Active |
| US8724115B2 | Linear stage and metrology architecture for reflective electron beam lithography | Electricity | 0 | Active |
| US9690213B2 | Linear Stage for reflective electron beam lithography | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.