Martin Dietzel
4Patents
0h-index
3Co-inventors
24Inventor score
Filing activity: Feb 20, 2019 → Dec 10, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US12288272B2 | Method for determining a production aerial image of an object to be measured | Physics | 0 | Active |
| US10481505B2 | Method for determining an imaging aberration contribution of an imaging optical unit for measuring lithography masks | Physics | 0 | Active |
| US10564551B2 | Method for determining a focus position of a lithography mask and metrology system for carrying out such a method | Physics | 0 | Active |
| US11061331B2 | Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.