Patent · US Active

Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth

US11061331B2 · kind B2 · utility

0Cited by

1References

10Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Markus Koch · Neu-Ulm, DE
Dirk Hellweg · Langenau, DE
Renzo Capelli · Heidenheim, DE
Martin Dietzel · Giengen an der Brenz, DE

Key dates

Filing date	Feb 20, 2019
Grant date	Jul 13, 2021
Priority date	—
Expiry date	Oct 10, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70641
WIPO fieldOptics
WIPO sectorInstruments

Abstract

For determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth, recorded 2D intensity distributions (15zi) of an unstructured measurement region of a lithography mask are evaluated in a spatially resolved manner.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.