Mats Ekberg
6Patents
3h-index
19Co-inventors
50Inventor score
Filing activity: Mar 2, 1998 → Oct 22, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6883158B1 | Method for error reduction in lithography | Physics | 65 | Expired |
| US6226163A | Device and method relating to protection of an object against over-currents comprising over-current reduction | Electricity | 17 | Expired |
| US6263124A | Photoconductive switch | Electricity | 3 | Expired |
| US7923182B2 | Multi-focus method of enhanced three-dimensional exposure of resist | Emerging Cross-Sectional Technologies | 2 | Active |
| US8067134B2 | Method of iterative compensation for non-linear effects in three-dimensional exposure of resist | Emerging Cross-Sectional Technologies | 1 | Active |
| US8057971B2 | Method of compensation for bleaching of resist during three-dimensional exposure of resist | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.