Method of iterative compensation for non-linear effects in three-dimensional exposure of resist

US8067134B2 · kind B2 · utility

Assignee

• MICRONIC MYDATA AB · SE

Inventors

• Torbjorn Sandstrom · Mölnlycke, SE
• Mikael Wahlsten · Stockholm, SE
• Mats Ekberg · Bissenkamp, SE
• Anders Svensson · Växjö, SE

Key dates

• Filing date: Oct 22, 2009
• Grant date: Nov 29, 2011
• Expiry date: Oct 22, 2029

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/146
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The field of this disclosure is making three-dimensional topographic structures by means of graduated exposure in a photosensitive material, such as a photoresist, photosensitive polymide, or similar. Such patterns may be written either to be used directly as optical, mechanical, fluidic, etc. components, e.g. diffusors, non-reflecting surfaces, Fresnel lenses and Fresnel prisms, computer-generated holograms, lenslet arrays, etc, or to be used as masters for the fabrication of such components by replication. Replication can be done by molding, pressing, embossing, electroplating, etching, as known in the art. This disclosure includes descriptions of using passive absorbing components in thin resist, using high gamma thick resists with high resolution pattern generators, using multiple focal planes including at least one focal plane in the bottom half of the resist, and iterative simulation of patterning and adjustment of an exposure map.