Polymers, photoresist compositions and methods of forming photolithographic patterns
US9298093B2 · kind B2 · utility
1Cited by
3References
7Claims
0Family size
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Key dates
| Filing date | Dec 31, 2011 |
| Grant date | Mar 29, 2016 |
| Priority date | — |
| Expiry date | Dec 31, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0046
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.