Mitchell Brooks
4Patents
3h-index
10Co-inventors
40Inventor score
Filing activity: Nov 21, 2017 → Jun 25, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10734238B2 | Atomic layer deposition and etch in a single plasma chamber for critical dimension control | Electricity | 7 | Active |
| US11211253B2 | Atomic layer deposition and etch in a single plasma chamber for critical dimension control | Electricity | 5 | Active |
| US10658174B2 | Atomic layer deposition and etch for reducing roughness | Electricity | 3 | Active |
| US11170997B2 | Atomic layer deposition and etch for reducing roughness | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.