Neema Rastgar
4Patents
1h-index
4Co-inventors
33Inventor score
Filing activity: Aug 19, 2015 → Jun 30, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9620376B2 | Self limiting lateral atomic layer etch | Electricity | 86 | Active |
| US10714354B2 | Self limiting lateral atomic layer etch | Electricity | 1 | Active |
| US12322579B2 | Metal contamination reduction in substrate processing systems with transformer coupled plasma | Electricity | 0 | Active |
| US11056321B2 | Metal contamination reduction in substrate processing systems with transformer coupled plasma | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.