Patrick Joyce
7Patents
6h-index
15Co-inventors
52Inventor score
Filing activity: Dec 12, 2001 → Jul 27, 2006
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6805801B1 | Method and apparatus to remove additives and contaminants from a supercritical processing solution | Performing Operations; Transporting | 71 | Expired |
| US6764552B1 | Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials | Chemistry; Metallurgy | 65 | Expired |
| US6715498B1 | Method and apparatus for radiation enhanced supercritical fluid processing | Emerging Cross-Sectional Technologies | 39 | Expired |
| US7309418B2 | Water contaminant indicators | Chemistry; Metallurgy | 27 | Active |
| US6800142B1 | Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatment | Emerging Cross-Sectional Technologies | 17 | Expired |
| US6951765B1 | Method and apparatus for introduction of solid precursors and reactants into a supercritical fluid reactor | Chemistry; Metallurgy | 11 | Expired |
| US6905556B1 | Method and apparatus for using surfactants in supercritical fluid processing of wafers | Chemistry; Metallurgy | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.