Method and apparatus for radiation enhanced supercritical fluid processing
US6715498B1 · kind B1 · utility
39Cited by
8References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 6, 2002 |
| Grant date | Apr 6, 2004 |
| Priority date | — |
| Expiry date | Sep 6, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A supercritical process vessel with an interior for holding a supercritical fluid is provided. A wafer support for supporting a wafer within the interior of a supercritical process vessel to expose the wafer to the supercritical fluid is provided. A lamp, which is able to operate at supercritical fluid pressures within the interior of the supercritical process vessel is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.