Patrick M. Troccolo
5Patents
5h-index
4Co-inventors
45Inventor score
Filing activity: Apr 5, 1996 → Jan 5, 2000
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5935733A | Photolithography mask and method of fabrication | Physics | 48 | Expired |
| US6021009A | Method and apparatus to improve across field dimensional control in a microlithography tool | Physics | 22 | Expired |
| US5795684A | Photolithography mask and method of fabrication | Physics | 16 | Expired |
| US6208748A | Monitoring focus of a lens imaging system based on astigmatism | Physics | 14 | Expired |
| US6051344A | Multiple reduction photolithography technique | Physics | 12 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.