Inventor · Yokohama, JP

Remi Numata

3Patents
3h-index
6Co-inventors
36Inventor score

Filing activity: Nov 17, 1993 → Dec 23, 1994

Most-cited inventions

PatentTitleAreaCited byStatus
US5501936A Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound Physics 15 Expired
US5478692A Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenone Physics 11 Expired
US5434031A Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive Physics 10 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.