Richard Versluis
6Patents
2h-index
25Co-inventors
47Inventor score
Filing activity: Nov 21, 2006 → Sep 26, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8382301B2 | Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination | Physics | 5 | Active |
| US8585224B2 | Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination | Physics | 2 | Active |
| US11194659B2 | Method for executing a quantum error correction cycle in a quantum computer | Physics | 1 | Active |
| US7624617B2 | Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system | Physics | 0 | Active |
| US7963144B2 | Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system | Physics | 0 | Active |
| US9176398B2 | Method and system for thermally conditioning an optical element | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.