Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system
US7624617B2 · kind B2 · utility
0Cited by
2References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 21, 2006 |
| Grant date | Dec 1, 2009 |
| Priority date | — |
| Expiry date | Jul 18, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A gas analyzing system is disclosed, the system including a gas analyzer and a reduced pressure chamber in which interior the gas analyzer is arranged, the reduced pressure chamber having an inlet configuration for a gas mixture inflow and an outlet configuration for a gas mixture outflow, wherein the outlet configuration during operation is connected to a pump system to facilitate the gas mixture outflow, the outlet configuration having a channel section and a flow section, the flow section having a cross-sectional area that is smaller than the cross-sectional area of the channel section.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.