Robert Allen David
2Patents
2h-index
12Co-inventors
31Inventor score
Filing activity: Apr 28, 2006 → Apr 28, 2006
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7521172B2 | Topcoat material and use thereof in immersion lithography processes | Physics | 4 | Active |
| US8945808B2 | Self-topcoating resist for photolithography | Physics | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.