Robert Ewald
3Patents
1h-index
19Co-inventors
37Inventor score
Filing activity: Jan 28, 2000 → Apr 2, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6143080A | Wafer processing reactor having a gas flow control system and method | Emerging Cross-Sectional Technologies | 33 | Expired |
| US8012000B2 | Extended pad life for ECMP and barrier removal | Performing Operations; Transporting | 1 | Active |
| US7344432B2 | Conductive pad with ion exchange membrane for electrochemical mechanical polishing | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.