Robert J. Markunas
15Patents
10h-index
21Co-inventors
68Inventor score
Filing activity: Sep 24, 1987 → Aug 9, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5180435A | Remote plasma enhanced CVD method and apparatus for growing an epitaxial semiconductor layer | Chemistry; Metallurgy | 563 | Expired |
| US5521360A | Apparatus and method for microwave processing of materials | Emerging Cross-Sectional Technologies | 141 | Expired |
| US6822326B2 | Wafer bonding hermetic encapsulation | Electricity | 104 | Expired |
| US4870030A | Remote plasma enhanced CVD method for growing an epitaxial semiconductor layer | Emerging Cross-Sectional Technologies | 63 | Expired |
| US7622324B2 | Wafer bonding hermetic encapsulation | Electricity | 61 | Expired |
| US5018479A | Remote plasma enhanced CVD method and apparatus for growing an epitaxial semconductor layer | Chemistry; Metallurgy | 56 | Expired |
| US6552295B2 | Plasma furnace disposal of hazardous wastes | Emerging Cross-Sectional Technologies | 35 | Expired |
| US5418018A | Chemical vapor deposition of diamond films using water-based plasma discharges | Chemistry; Metallurgy | 17 | Expired |
| USH667H | Patterned tunnel junction | General | 12 | Active |
| US6558504B1 | Plasma processing system and method | Electricity | 10 | Expired |
| US5168330A | Semiconductor device having a semiconductor substrate interfaced to a dissimilar material by means of a single crystal pseudomorphic interlayer | Electricity | 8 | Expired |
| US5908565A | Line plasma vapor phase deposition apparatus and method | Electricity | 8 | Expired |
| US5585292A | Method of fabricating a thin film transistor | Electricity | 6 | Expired |
| US5480686A | Process and apparatus for chemical vapor deposition of diamond films using water-based plasma discharges | Chemistry; Metallurgy | 6 | Expired |
| US7112536B2 | Plasma processing system and method | Electricity | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.