Robert M. Bigwood
8Patents
3h-index
13Co-inventors
50Inventor score
Filing activity: Oct 29, 2004 → Aug 17, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7470492B2 | Process window-based correction for photolithography masks | Physics | 9 | Active |
| US9558947B2 | Pattern decomposition lithography techniques | Electricity | 6 | Active |
| US10319625B2 | Metal via processing schemes with via critical dimension (CD) control for back end of line (BEOL) interconnects and the resulting structures | Electricity | 4 | Active |
| US10409152B2 | Pattern decomposition lithography techniques | Electricity | 3 | Active |
| US10490519B2 | Pattern decomposition lithography techniques | Electricity | 2 | Active |
| US11107786B2 | Pattern decomposition lithography techniques | Electricity | 1 | Active |
| US10636700B2 | Metal via processing schemes with via critical dimension (CD) control for back end of line (BEOL) interconnects and the resulting structures | Electricity | 0 | Active |
| US12278204B2 | Pattern decomposition lithography techniques | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.