Roman Chalykh
4Patents
2h-index
9Co-inventors
33Inventor score
Filing activity: Jan 12, 2016 → Mar 10, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10719008B2 | Phase-shift mask for extreme ultraviolet lithography | Physics | 2 | Active |
| US9952502B2 | Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same | Physics | 2 | Active |
| US10274820B2 | Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same | Physics | 1 | Active |
| US11372323B2 | Phase-shift mask for extreme ultraviolet lithography | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.