Ryota MAE
3Patents
0h-index
4Co-inventors
24Inventor score
Filing activity: Feb 21, 2020 → Sep 1, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11814294B2 | Method of producing anionically modified colloidal silica | Chemistry; Metallurgy | 0 | Active |
| US11884843B2 | Polishing composition, polishing method, and method of producing semiconductor substrate | Electricity | 0 | Active |
| US11702570B2 | Polishing composition | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.