Scott Edward Fuller
8Patents
4h-index
11Co-inventors
50Inventor score
Filing activity: Jul 23, 2001 → Jan 29, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6703169B2 | Method of preparing optically imaged high performance photomasks | Emerging Cross-Sectional Technologies | 14 | Expired |
| US8502172B1 | Three dimensional fiducial | Emerging Cross-Sectional Technologies | 5 | Active |
| US10204762B2 | Endpointing for focused ion beam processing | Electricity | 4 | Active |
| US10068749B2 | Preparation of lamellae for TEM viewing | Electricity | 4 | Active |
| US6998206B2 | Method of increasing the shelf life of a blank photomask substrate | Emerging Cross-Sectional Technologies | 2 | Expired |
| US7208249B2 | Method of producing a patterned photoresist used to prepare high performance photomasks | Physics | 1 | Expired |
| US10529538B2 | Endpointing for focused ion beam processing | Electricity | 0 | Active |
| US8822957B2 | Three dimensional fiducial | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.