Sen Liu
37Patents
6h-index
23Co-inventors
65Inventor score
Filing activity: Jan 15, 2003 → Oct 30, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7425643B1 | Electron acceptors for nonlinear optical chromophores | Chemistry; Metallurgy | 18 | Active |
| US7014796B2 | Nonlinear optical compounds and methods for their preparation | Physics | 14 | Expired |
| US7346259B1 | Thermally reversibly crosslinkable polymer as cladding material for electro-optic devices | Physics | 12 | Expired |
| US7838200B2 | Photoresist compositions and method for multiple exposures with multiple layer resist systems | Physics | 10 | Active |
| US7078542B2 | Nonlinear optical compounds and methods for their preparation | Physics | 7 | Expired |
| US7655379B2 | Ionic, organic photoacid generators for DUV, MUV and optical lithography based on peraceptor-substituted aromatic anions | Physics | 6 | Active |
| US8343706B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | Emerging Cross-Sectional Technologies | 6 | Active |
| US8871596B2 | Method of multiple patterning to form semiconductor devices | Electricity | 4 | Active |
| US8709700B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | Emerging Cross-Sectional Technologies | 4 | Active |
| US8236476B2 | Multiple exposure photolithography methods and photoresist compositions | Emerging Cross-Sectional Technologies | 4 | Active |
| US8293451B2 | Near-infrared absorbing film compositions | Physics | 4 | Active |
| US8628909B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | Emerging Cross-Sectional Technologies | 3 | Active |
| US8617791B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | Emerging Cross-Sectional Technologies | 3 | Active |
| US8518630B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | Emerging Cross-Sectional Technologies | 3 | Active |
| US8623584B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | Emerging Cross-Sectional Technologies | 3 | Active |
| US8663901B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | Emerging Cross-Sectional Technologies | 3 | Active |
| US8715907B2 | Developable bottom antireflective coating compositions for negative resists | Physics | 3 | Active |
| US8999624B2 | Developable bottom antireflective coating composition and pattern forming method using thereof | Chemistry; Metallurgy | 3 | Active |
| US8658345B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | Emerging Cross-Sectional Technologies | 3 | Active |
| US8628910B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | Emerging Cross-Sectional Technologies | 3 | Active |
| US9040225B2 | Developable bottom antireflective coating composition and pattern forming method using thereof | Chemistry; Metallurgy | 2 | Active |
| US8772376B2 | Near-infrared absorbing film compositions | Emerging Cross-Sectional Technologies | 2 | Active |
| US8568960B2 | Multiple exposure photolithography methods | Emerging Cross-Sectional Technologies | 2 | Active |
| US7910538B2 | Detergent composition | Chemistry; Metallurgy | 2 | Active |
| US8986918B2 | Hybrid photoresist composition and pattern forming method using thereof | Emerging Cross-Sectional Technologies | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.