Tae-Min Eom
7Patents
3h-index
13Co-inventors
46Inventor score
Filing activity: Jan 9, 2003 → Aug 22, 2008
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6803241B2 | Method of monitoring contact hole of integrated circuit using corona charges | Electricity | 11 | Expired |
| US7186280B2 | Method of inspecting a leakage current characteristic of a dielectric layer and apparatus for performing the method | Physics | 10 | Expired |
| US7427573B2 | Forming composite metal oxide layer with hafnium oxide and titanium oxide | Electricity | 4 | Expired |
| US8138057B2 | Metal oxide alloy layer, method of forming the metal oxide alloy layer, and methods of manufacturing a gate structure and a capacitor including the metal oxide alloy layer | Electricity | 2 | Active |
| US7310140B2 | Method and apparatus for inspecting a wafer surface | Physics | 1 | Expired |
| US6927077B2 | Method and apparatus for measuring contamination of a semiconductor substrate | Physics | 1 | Expired |
| US6869215B2 | Method and apparatus for detecting contaminants in ion-implanted wafer | Physics | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.