Tomoko Owada
14Patents
4h-index
11Co-inventors
49Inventor score
Filing activity: Jun 9, 2017 → Apr 19, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| USD839224S1 | Elastic membrane for semiconductor wafer polishing | General | 27 | Active |
| USD859332S1 | Elastic membrane for semiconductor wafer polishing | General | 10 | Active |
| USD913977S1 | Elastic membrane for semiconductor wafer polishing | General | 5 | Active |
| USD989012S1 | Elastic membrane | General | 4 | Active |
| US11179823B2 | Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membrane | Performing Operations; Transporting | 2 | Active |
| USD918161S1 | Elastic membrane | General | 1 | Active |
| US11088011B2 | Elastic membrane, substrate holding device, and polishing apparatus | Performing Operations; Transporting | 1 | Active |
| US11958163B2 | Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membrane | Electricity | 1 | Active |
| US11731235B2 | Polishing apparatus and polishing method | Performing Operations; Transporting | 0 | Active |
| US11745306B2 | Polishing apparatus and method of controlling inclination of stationary ring | Performing Operations; Transporting | 0 | Active |
| USD1021832S1 | Elastic membrane | General | 0 | Active |
| US12068189B2 | Elastic membrane, substrate holding device, and polishing apparatus | Performing Operations; Transporting | 0 | Active |
| USD981969S1 | Elastic membrane for semiconductor wafer polishing apparatus | General | 0 | Active |
| US11654524B2 | Method of detecting abnormality of a roller which transmits a local load to a retainer ring, and polishing apparatus | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.