Patent · US Active

Elastic membrane for semiconductor wafer polishing apparatus

USD981969S1 · kind S1 · design

0Cited by
13References
1Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 15, 2021
Grant dateMar 28, 2023
Priority date
Expiry dateMar 28, 2038

Classification

  • Technology area (CPC —)General

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.