Tomoyasu YASHIMA
2Patents
0h-index
4Co-inventors
21Inventor score
Filing activity: Jun 19, 2017 → Nov 21, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11156920B2 | Lithography composition, a method for forming resist patterns and a method for making semiconductor devices | Physics | 0 | Active |
| US10451974B2 | Rinse composition, a method for forming resist patterns and a method for making semiconductor devices | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.