Rinse composition, a method for forming resist patterns and a method for making semiconductor devices
US10451974B2 · kind B2 · utility
0Cited by
2References
11Claims
0Family size
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Key dates
| Filing date | Jun 19, 2017 |
| Grant date | Oct 22, 2019 |
| Priority date | — |
| Expiry date | Jun 19, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2004
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to a new rinse composition, the forming of resist patterns using the rinse composition, and a semiconductor device manufacturing method using the rinse composition in a photolithography method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.