Wendy Yan
4Patents
4h-index
11Co-inventors
40Inventor score
Filing activity: Sep 17, 1998 → Sep 16, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7127421B1 | Method and system for identifying bottlenecks in a securities processing system | Physics | 13 | Expired |
| US6903023B2 | In-situ plasma etch for TERA hard mask materials | Electricity | 8 | Expired |
| US6686296B1 | Nitrogen-based highly polymerizing plasma process for etching of organic materials in semiconductor manufacturing | Electricity | 6 | Expired |
| US6228279A | High-density plasma, organic anti-reflective coating etch system compatible with sensitive photoresist materials | Electricity | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.