Yunqiang Zhang
5Patents
3h-index
9Co-inventors
50Inventor score
Filing activity: Oct 5, 1998 → Feb 24, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6303458A | Alignment mark scheme for Sti process to save one mask step | Electricity | 13 | Expired |
| US6107140A | Method of patterning gate electrode conductor with ultra-thin gate oxide | Electricity | 9 | Expired |
| US7568180B2 | Generalization of the photo process window and its application to OPC test pattern design | Physics | 4 | Expired |
| US7966583B2 | Method and apparatus for determining the effect of process variations | Physics | 1 | Active |
| US11874597B2 | Stochastic optical proximity corrections | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.