Yuval Lamhot
5Patents
1h-index
20Co-inventors
43Inventor score
Filing activity: Apr 5, 2018 → Jan 25, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10699969B2 | Quick adjustment of metrology measurement parameters according to process variation | Electricity | 1 | Active |
| US11454894B2 | Systems and methods for scatterometric single-wavelength measurement of misregistration and amelioration thereof | Electricity | 0 | Active |
| US11158548B2 | Overlay measurement using multiple wavelengths | Physics | 0 | Active |
| US11862522B2 | Accuracy improvements in optical metrology | Electricity | 0 | Active |
| US11861824B1 | Reference image grouping in overlay metrology | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.